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Optical Metrology
A compact broadband EUV laser-plasma source for metrological applications
12.11.2009 - Photonik international 2/2009 | 
[ deutsche Version lesen ]
Metrology applications require compact laser-plasma sources that generate broad extreme ultra-violet (EUV) radiation cost effectively. A combination of a small diode-pumped Nd:YAG laser and a cylindrical gold-coated target emits brilliant, spatially stable beams without the drawback of debris-deposition.
Photonik I2/2009
Authors: Lothar Koch, Bernd Wellegehausen, Leibniz Universität Hannover, Germany
